|Output wavelength||1280 nm|
|Output power||Up to 30 mW|
|Pulsewidth||< 250 fs|
|Pump source||Fully integrated Spark 1040|
|Repetition frequency||100 MHz|
|Control interface||Ethernet, and web page
Serial port (for control via LabView/MatLab)
The Chromacity Spark X system delivers light at 1.28 µm. The ability to generate ultrashort pulsed light at this specific infrared wavelength is key to 2-photon imaging of semiconductor wafers. The band gap energy of the wafer materials need to be overcome. This is typically achieved beyond 1.2 µm.
The output from the PCF (photonic crystal fibre) stage is collimated as free space output for easy integration into microscope setups and test and measurement equipment. This enables excellent beam quality with single mode output which is linearly polarised.
Integrating the pump source, wavelength shifting module and pulse picker all onto a monolithic baseplate has allowed us to design an extremely compact system. The Chromacity Spark X replaces the need to accommodate several individual modules and frees up valuable space on a lab bench where, typically, space is at a premium.
Removing the complexities of traditional ultrafast laser systems, while maintaining the high performance characteristics that are expected by the photonics industry has allowed us to develop a system that can be acquired at a low cost of ownership.
The Chromacity Spark X is machined from a single block of high-grade aluminium and designed specifically to deliver output with an outstanding level of reliability and without the need for water cooling.
An intuitive web-based user-interface allows for easy control of the Spark X. This relaxes the constraints of having to be near the laser system to use it.
With the ability to lock to an external clock the Spark X can be easily integrated into a wide range of applications where pulse repetition frequency stability is key.
The Chromacity Spark X is an ideal ultrashort pulse source for a wide variety of industrial and scientific applications including two-photon stimulation of CMOS circuits, OBIC imaging, sub-surface confocal laser-scanning microscopy, pump-probe measurements and other forms of material characterization.